Amir Hasanbegovic
Stipendiat
English
E-post
amirh@ifi.uio.no
Telefon
+47 22840835
Rom
GA06-5122
Brukernavn
Besøksadresse
Institutt for informatikk
Ole-Johan Dahls Hus 23D
0373 OSLO
Postadresse
Institutt for informatikk
Postboks 1080 Blindern
0316 OSLO
Faglige interesser
Lav effekt- og strålings redundant CMOS design i kommersielle prosess teknologier.
Undervisning
INF3400
Bakgrunn
M.Sc. 2010
Publikasjoner
- Berge, Hans Kristian Otnes; Hasanbegovic, Amir & Aunet, Snorre (2011). Muller C-elements based on Minority-3 Functions for Ultra Low Voltage Supplies, In Heinrich Vierhaus (ed.), Proceedings of the 14th IEEE Symposium on Design and Diagnostics of Electronic Circuits and Systems. IEEE conference proceedings. ISBN 978-1-4244-9753-9. kapittel.
- Hasanbegovic, Amir & Aunet, Snorre (2011). Low-power subthreshold to above threshold level shifters in 90 nm and 65 nm process. Microprocessors and microsystems. ISSN 0141-9331. 35(1), s 1- 9 . doi: 10.1016/j.micpro.2010.11.003
- Aunet, Snorre & Hasanbegovic, Amir (2010). Memory Elements Based on Minority-3 Gates and Inverters Implemented in 90 nm CMOS , In Zdenek Kotasek (ed.), Proceedings of the 13th IEEE International Symposium on Design and Diagnostics of Electronic Circuits and Systems. IEEE Press. ISBN 978-1-4244-6610-8. kapittel. s 267 - 272
- Hasanbegovic, Amir & Aunet, Snorre (2009). Low-Power Subthreshold to Above Threshold Level Shifter in 90 nm Process, In Trond Ytterdal & Snorre Aunet (ed.), Proceedings of the 27th Norchip Conference, Trondheim, 16.-17. November, 2009.. IEEE conference proceedings. ISBN 978-1-4244-4311-6. kapittel.
- Aunet, Snorre & Hasanbegovic, Amir (2010). Memory Elements Based on Minority-3 Gates and Inverter5s Implemented in 90 nm CMOS.
- Hasanbegovic, Amir (2010). Low power and radiation tolerant CMOS design using commercial technologies .
- Hasanbegovic, Amir (2010). Low power radiation tolerant CMOS design using commercial fabrication processes .
- Hasanbegovic, Amir & Aunet, Snorre (2010). Low Power CMOS Design - Exploring Radiation Tolerance in a 90 nm Low Power Commercial Process.
Publisert 4. nov. 2010 13:57
- Sist endret 3. apr. 2011 20:04