Photolithography

Photolithography explained

Open your lab notebook and note down what you are going to do for today and as you go on the day, note all observations and final result
Decide how thick layer of SU8 you need. Choose right SU8 and protocol
- GM1060 for layers between 5-25µm. Full datasheet
- GM1070 for layers between 15-200µm. Full datasheet
Find and note the following parameters from the datasheet page 7. Remember to include calculation for illumination and development time (experienced by Mathias, Meng and Ali) for 1060 and 1070 parameters:
- Speed of spin-coater in rpm
- Pre- and post-bake times at 65 and 95 C, t_{65}, t_{95}
- Exposure dose (divide the number from the table by factor 2 to 4, follow Mathias' measurement, use 20% power and multiply the time by 5)
- PGMEA development time
Take SU8 out of fridge and place in cupboard in 129
Program
- Spin coater
- Hotplate

UV doses in the tables are to large. Look at comments in Mathias Busek's procedures
The programable hotplate is not reliable
- Two times in a row the same procedure for 25 um thick substrate with VWR and programmable hot plates gave good results for VWR hotplate but overdevelopment for programmable hotplate.
- I have observed that the programmable hotplate seems to spend too long time at each step.

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Important notes 05.03.2021 =

Published June 20, 2025 4:49 PM - Last modified Sep. 9, 2026 1:19 PM