martnyb

• Nyborg, Martin; Karlsen, Kjetil; Bergum, Kristin & Monakhov, Eduard (2021). Dominant acceptors in Li doped, magnetron deposited Cu2O films. Materials Research Express. ISSN 2053-1591. 8(12), p. 1–8. doi: 10.1088/2053-1591/ac3e24. Full text in Research Archive
• Nyborg, Martin; Kolevatov, Ilia; Vasquez, Geraldo Cristian; Bergum, K. & Monakhov, E. (2021). Dominant defects and carrier transport in single crystalline cuprous oxide: A new attribution of optical transitions. Journal of Applied Physics. ISSN 0021-8979. 130(17). doi: 10.1063/5.0059406. Full text in Research Archive
• Nyborg, Martin; Azarov, Alexander; Bergum, Kristin & Monakhov, Eduard (2021). Deposition and characterization of lithium doped direct current magnetron sputtered Cu2O films. Thin Solid Films. ISSN 0040-6090. 722(31), p. 1–5. doi: 10.1016/j.tsf.2021.138573. Full text in Research Archive

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• Bathen, Marianne Etzelmüller; Borgersen, Jon Arthur; Karlsen, Kjetil; Nyborg, Martin; Olsen, Vegard Skiftestad & Reinertsen, Vilde Mari [Show all 7 contributors for this article] (2019). Skolebesøk ved MiNaLab.
• Nyborg, Martin; Bergum, Kristin; Monakhov, Eduard & Svensson, Bengt Gunnar (2018). Nitrogen Doping of Sputtered Cuprous Oxide Thin Films by ion Implantation .
• Nyborg, Martin; Monakhov, Eduard & Bergum, Kristin (2018). Lithium Doped DC Magnetron Sputtered Cu2O Thin Films .
• Nyborg, Martin; Lindberg, Per; Svensson, Bengt Gunnar; Monakhov, Edouard & Galeckas, Augustinas (2017). DC Magnetron Sputter Deposition of CuxO Thin Films The Effect of Target Power and O2 Flow. Show summary

  In this study, we report on the effect of target power and O2 flow on DC magnetron sputter deposited CuxO thin films. Target power (Ptar) and oxygen flow (QO2) have been varied in the 80 - 100 W and 12-19 sccm range while keeping all other parameters constant.

• Bathen, Marianne Etzelmüller; Borgersen, Jon Arthur; Grini, Sigbjørn; Johansen, Klaus Magnus H; Nyborg, Martin & Olsen, Vegard Skiftestad [Show all 7 contributors for this article] (2017). Omvisning FAM.

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