The PLD system consists of a COMPex pro 205F excimer laser that is connected to two independent deposition chambers. High-energy laser pulses are used to create plasma plumes from a solid target. The ablated material is transferred through the vacuum chamber and is deposited on a substrate that is positioned directly opposite of the target.
Instrument Features
Substrate size: The H chamber features a clamping system that enables a variety of substrate geometries, most commonly 10x10 mm squares. The C chamber features a rotating substrate holder, enabling homogenous depositions on larger substrates (up to 2 in. wafers).
Substrate temperature: RT to 950 °C. The substrate temperature is controlled independently of the deposition process, which facilitates amorphous thin film growth at low temperatures or crystalline thin film growth at high temperatures. Low-temperature depositions are compatible with temperature sensitive substrates, such as substrates partially covered by photoresist.
Inert and reactive gases: Both chambers have Ar, O2, and N2 gas lines equipped with individual mass flow controllers.
Pressure: The atmosphere in the chambers can be adjusted for ballistic or reactive depositions, with a base pressure in the 10-8 mbar range.
Target materials: Up to 6 different targets can be mounted in a chamber at the same time, and targets can be exchanged without breaking vacuum. Commercial targets can be used, and PLD targets are also fabricated in-house at UiO. This maximizes the level of flexibility regarding composition and geometries. PLD is especially well suited for metal oxide depositions, certain nitrides are also available. Please contact UiO MiNaLab to discuss material compatibilities.
Lateral gradients: Segmented targets enable the deposition of thin films with lateral compositional gradients. This creates a spatially addressable materials library on a single wafer where physical properties can be investigated systematically as functions of chemical composition. Segmented targets are not commercially available and must be prepared at UiO.
Post-deposition annealing: The PLD system can also be used to heat-treat samples up to 900 °C in vacuum or gas flow.
Prices
The PLD is available for rent with or without an operator.
| User Category | Price without operator/hour | Price with operator/hour |
|---|---|---|
| Academia | 600 NOK | 1350 NOK |
| Start-up | 750 NOK | 1850 NOK |
| Industry | 900 NOK | 2000 NOK |
Prices are in Norwegian kroner (NOK) excl. VAT. All prices are subject to change. The reduced fees for start-up companies are available for the first 24 months after start-up. Training costs are currently covered by NorFab.
Contact
- Simon Phillip Cooil, Lab Manager
- Eirini Zacharaki, Research Infrastructure Coordinator