Rapid thermal processing describes a class of techniques that provide a way to rapidly anneal wafers to elevated temperatures for relatively short times. Heating is performed optically using quartz lamps and process temperatures of 600 – 1200 °C can be achieved, with ramp rates of 50 °C/s.
Instrument Features
- AnnealSys Micro for small size samples up to 50 mm (2 in.). No material restrictions apply.
- AnnealSys One for small size samples up to 100 mm (4 in.). Only for pure Si.
- Rapid thermal heating for target up to 1200 °C.
Prices
Rapid thermal processing is available with or without an operator. Prices are in Norwegian kroner (NOK) excl. VAT. All prices are subject to change.
| User Category | Price without operator/hour | Price with operator/hour |
|---|---|---|
| Academia | 500 NOK | 1250 NOK |
| Start-up | 625 NOK | 1725 NOK |
| Industry | 750 NOK | 1850 NOK |
The reduced fees for start-up companies are available for the first 24 months after start-up. Training costs are currently covered by NorFab.
Contact
- Simon Phillip Cooil, Lab Manager
- Eirini Zacharaki, Research Infrastructure Coordinator