NAFUMA seminar 3

Description of the talk: “Atomic layer deposition (ALD) of NdFeO3 thin films has not yet been reported in current literature but could be key in unlocking the emergent properties that have been predicted for this class of materials. In developing an ALD process for epitaxial NdFeO3, we observed unexpected variations in the growth characteristics of the Nd-Fe-O system depending on the type of iron-precursor used for certain compositions. In this presentation, we showcase both the successes and mysteries of our findings and welcome any input that could help elucidate the origin of these observations”.