NAFUMA at the ALD 2024!

The AVS 24th international Conference on Atomic Layer Deposition (ALD 2024) in Helsinki just concluded, and NAFUMA sent the largest delegation ever!

The NAFUMA delegation to the conference ALD 24 in Helsinki.

First row from the the left; Henrik Hovde Sønsteby, Dharsana Pulikkottil Dinesh, Linn Rykkje, Melania Rogowska.
Second row from the left; Sajmohan , Anjali Choubey, Andreas Alstad, Yani Amedjkouh, Ola Nilsen.

Lasting Sunday 4th of August to Wednesday 7th August with a full program, sprinkled with many NAFUMA contributions!

Anjali Coubey on stage.
Linn Rykkje on stage.

 

Anjali Choubey with the talk "Utilizing Low-Temperature Ald technique to investigate Perovskite Nickelates for Photovoltaic Applications".

 

 

 

 

 

Linn Rykkje with the talk "Epitaxial Rare-Earth Orthoferrites by Atomic Layer Deposition".

 

Andreas Alstad on stage.


 

 

 

 

Andreas Alstad with the talk "Novel Synthesis Route for Atomic Layer Epitaxi of BaSnO3"
 

 

 

 

 

Yani Amedjkouh on stage.

 

Yani Amedjkouh with the talk "Benchmarking 4 Different Cobalt Precursors for Atomic Layer Deposition of Complex Cobalt Oxides".

 

 

 

 

Dharsana Pulikkottil Dinesh at the poster session.

 

Dharsana Pulikkottil Dinesh with the poster "Ozone-based Atomic Layer Deposition of Titanium Dioxide (TiO2)".
 

 

 

 

 

 

 


The conference also included Ola Nilsen with the talk "QCM the UiO way, a Tutorial", Melania Rogowska with the poster "Luminescent Lanthanide-Organic Hybrid Materials by Atomic/Molecular Layer Deposition", and Henrik Hovde Sønsteby with the talk "Complex Materials for Next Generation Electronics and Photonics - ALD will Prevail!".

Published Aug. 8, 2024 2:34 PM